HELiA

最新一代电池片镀膜系统

HELiA是最新一代高效异质结电池片镀膜系统。

生产异质结(HJT)太阳能电池片的核心设备是HELiAPECVD和HELiAPVD。这两套系统之间的技术匹配性堪称完美,每小时硅片总产能高达2,400片。

HELiA是“高效低杂质设备”的简称,该平台用于完成两种异质结电池片镀膜工艺。 HELiAPECVD(带

S-Cube™反应器)用于沉积本征非晶硅膜层作为钝化层,并沉积p-掺杂和n-掺杂非晶硅膜层。HELiAPVD使用透明导电氧化物(TCO)完成双面镀膜,无需翻转硅片。

由于工作温度低,异质结技术可谓是超薄硅片的理想选择。

为您带来的效益:

  • 异质结技术集非晶硅(薄膜)与单晶硅片的优势于一身
  • 电池片转换效率超过24%,并且还有提升潜力
  • 生产工序减少,只需6步
  • 出众的温度系数(-0.25%/K),大幅提升了发电量
  • 非常适合薄片加工,可与SmartWire智能网栅连接技术结合使用

More details about both HELiA machines.

HELiAPECVD - Maximum passivation

High-quality amorphous silicon (a-Si) layers are a key factor in producing high-efficiency heterojunction solar cells. Both intrinsic a-Si layers for passivation and doped a-Si layers for manufacturing heterojunction cells can be deposited with the HELiAPECVD system type.

The a-Si layers are deposited using the PECVD (plasma-enhanced chemical vapor deposition) process. Meyer Burger developed a special patented plasma reactor - the S-Cube - for this purpose. This ensures that a-Si layers with outstanding electrical and passivation properties are deposited homogeneously.
 

HELiAPVD - Low-cost TCO coating

Heterojunction cells are bonded on both sides by means of transparent, conductive oxide (TCO) layers, deposited using the PVD (physical vapor deposition) process.

In the HELiAPVD sputtering system, differing contact layers (including multiple layers and metal layers) can be deposited successively on the front and rear of the wafers without the need to turn the wafers between coating processes. By using cylindrical sputtering magnetrons, a high target utilization rate is achieved, thus ensuring a cost-effective coating process.

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