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ALD

ALD

Deposition of thin films on plan as well as three-dimensional substrate surfaces for the production of single layers and complex multilayers

Our systems use low-pressure processes for the deposition of thin films on plane as well as on three-dimensional substrate surfaces. Single layers and complex multilayer coatings of very different layer materials are possible.

 

Atomic layer deposition (ALD) is a highly modified CVD process for the deposition of thin coatings by means of two or more sequentially applied, self-limiting surface reactions. As a general rule, the coatings have a polycrystalline or amorphous structure.

Contact

Sales MicroSystems

+49 3723 671 234

Sales Meyer Burger (Netherlands) B.V.

+31 (0) 40 2581 581

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