Deposition of thin films on plan as well as three-dimensional substrate surfaces for the production of single layers and complex multilayers

Our systems use low-pressure processes for the deposition of thin films on plane as well as on three-dimensional substrate surfaces. Single layers and complex multilayer coatings of very different layer materials are possible.

The term physical vapor deposition (PVD) describes a group of vacuum-based coating processes and thin film technologies. Unlike in chemical vapor deposition processes, physical processes are employed to convert the starting material into the vapor phase. The gaseous material is then guided to the substrate to be coated where it condenses, forming the target coating.


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