Deposition of thin films on plan as well as three-dimensional substrate surfaces for the production of single layers and complex multilayers


Our systems use low-pressure processes for the deposition of thin films on plane as well as on three-dimensional substrate surfaces. Single layers and complex multilayer coatings of very different layer materials are possible.

The term chemical vapor deposition (CVD) encompasses a group of coating processes used in applications such as the production of microelectronic components and fiber optic cables. The dissociation (splitting) of the reaction gas molecules takes place through the application of external heat together with the energy released in the subsequent chemical reactions.


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