header-home-mbt 01

Ion Beam Deposition to top

Ionsys 500

The IonSys 500 is a compact and reasonably priced ion beam etching tool for processing of up to 150 mm substrates.

bottom

IonSys 800

The IonSys 800 is designed for industrial ion beam etching and deposition processes with maximum quality and productivity requirements.

bottom

Plasma Deposition to top

MicroSys 200 / 300

The MicroSys system is designed as a cost effective but high quality solution for research and small scale production applications.


bottom

FLEx R2R PECVD

The FLEx R2R PECVD is a thermal plasma-based PECVD piece of production equipment for the deposition of thin and thick R2R films for various applications like photovoltaics, displa...

bottom

FLEx S2S sALD

The FLEx S2S sALD is suitable for application development that require high speed ALD coating technology combined with excellent uniformity.

bottom

FLEx XL

The FLEx XL is a thermal plasma-based PECVD piece of production equipment for the deposition of thin and thick S2S films for various applications like photovoltaics, display and ba...

bottom

FLEx LT

The FLEx LT is a thermal plasma-based PECVD piece of R&D equipment for the deposition of thin and thick S2S films for various applications like photovoltaics, display and batteries...

bottom
print/drucken